Principles of Plasma Discharges and Materials Processing




Author: Allan J. Lichtenberg, Michael A. Lieberman
Type: eBook
Date Released: 1994
Format: djvu
Language: English
Page Count: 299
Isbn10 Code: 0471005770
Isbn13 Code: 9780471005773


Timely, authoritative, pedagogically consistent— a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications—especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.In-depth coverage of the fundamentals of plasma physics and chemistry—includes separate chapters on atomic and molecular collisionsApplies basic theory to plasma discharges, including calculations of plasma parameters and scaling of plasma parameters with control parametersApplies results to basic processing mechanisms and the effects of plasma parameters on those mechanismsUses numerous worked examples to demonstrate the relationships between control parameters, plasma parameters, and processing results

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